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Samsung SDI
Create a win-win situation together through meticulous and profession services.
Create a win-win situation together through meticulous and profession services.
Founded in 1970, Samsung SDI celebrates its 50th anniversary in 2020. Global network consist of a total of 30 locations, including the Headquarters, the R&D Center, production facilities and sales bases.
Starting from the development of semiconductor process material EMC in 1994 which is designed to protect semiconductor circuits from factors in external environment. By using advanced technology and based of professional strength, Samsung SDI continues to maintain the world’s top level of business competitiveness.
EMC effectively protects semiconductor circuits from factors in the external environment such as moisture, heat, and shock. It applications include memory, system LSI, individual devices, and so on.
| MUF EMC | PoP-t EMC | Granule EMC |
|---|---|---|
| Excellent assembly yield improvement | Best solution for Warpage control | Excellent moldability with higher spreadability |
| Curable at low temperature | Excellent yield improvement | Short cure time for higher productivity |
| Best productivity | Maximizing customer’s productivity | Excellent granule size control |
| Wide process window | Wide process window | Wide process window |
| Grade | Unit | SG-8500AGM | SG-8500RMB | SG-8500MG | SG-8300UF |
|---|---|---|---|---|---|
| EMC type | – | Granule | Granule | Granule | Granule |
| Filler over cut size | um | 45 | 45 | 45 | 20 |
| Mold shrinkage | % | 0.11 | 0.25 | 0.19 | 0.25 |
| Spiral flow | cm | 58 | 129 | 155 | 145 |
| Gelation time(175℃) | sec | 52 | 43 | 45 | 31 |
| Flexural Modulus(RT) | MPa | 27887 | 30757 | 23047 | 24543 |
| Tg | ℃ | 148 | 124 | 133 | 145 |
| C.T.E (α1) | ppm/℃ | 8 | 28 | 10 | 13 |
| C.T.E (α2) | ppm/℃ | 32 | 124 | 38 | 52 |
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